Dielectric properties of continuous composition spreaded MgO-Ta2O5 thin films
- Authors
- Kim, Yun Hoe; Song, Jong-Han; Kim, Jin Sang; Yoon, Seok-Jin; Park, Kyung Bong; Choi, Ji-Won
- Issue Date
- 2011-11-01
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- APPLIED SURFACE SCIENCE, v.258, no.2, pp.843 - 847
- Abstract
- The dielectric properties of MgO-Ta2O5 continuous composition spread (CCS) thin films were investigated. The MgO-Ta2O5 CCS thin films were deposited on Pt/Ti/SiO2/Si substrates by off-Axis RF magnetron sputtering system, and then the films were annealed at 350 degrees C with rapid thermal annealing system in vacuum. The dielectric constant and loss of MgO-Ta2O5 CCS thin films were plotted via 1500 micron-step measuring. The specific point of Ta2O5-MgO CCS thin film (post annealed at 350 degrees C) showing superior dielectric properties of high dielectric constant (k similar to 28) and low dielectric loss (tan delta < 0.004) at 1 MHz were found in the area of 3-5 mm apart from Ta2O5 side on the substrate. The cation's composition of thin film was Mg:Ta = 0.4:2 at%. (C) 2011 Elsevier B. V. All rights reserved.
- Keywords
- MIM CAPACITORS; DENSITY; METAL; PERFORMANCE; ELECTRODE; MIM CAPACITORS; DENSITY; METAL; PERFORMANCE; ELECTRODE; High-k; Thin films; Continuous composition spread; RF magnetron sputtering
- ISSN
- 0169-4332
- URI
- https://pubs.kist.re.kr/handle/201004/129812
- DOI
- 10.1016/j.apsusc.2011.09.004
- Appears in Collections:
- KIST Article > 2011
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.