Formation mechanisms of metallic Zn nanodots by using ZnO thin films deposited on n-Si substrates

Authors
Yuk, J. M.Lee, J. Y.Kim, Y.No, Y. S.Kim, T. W.Choi, W. K.
Issue Date
2010-08-09
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.97, no.6
Abstract
High-resolution transmission electron microscopy and energy dispersive x-ray spectroscopy results showed that metallic Zn nanodots (NDs) were fabricated through transformation of ZnO thin films by deposition of SiO(x) on ZnO/n-Si (100) heterostructures. The Zn NDs with various sizes and densities were formed due to the occurrence of the mass diffusion of atoms along the grain boundaries in the ZnO thin films. The fabrication mechanisms of metallic Zn NDs through transformation of ZnO thin films deposited on n-Si substrates are described on the basis of the experimental results. (C) 2010 American Institute of Physics. [doi:10.1063/1.3475016]
Keywords
QUANTUM-DOT LASER; ELECTROLUMINESCENCE; QUANTUM-DOT LASER; ELECTROLUMINESCENCE; atomic force microscopy; diffusion; grain boundaries; nanofabrication; nanostructured materials; sputter etching; transmission electron microscopy; X-ray chemical analysis; zinc
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/131180
DOI
10.1063/1.3475016
Appears in Collections:
KIST Article > 2010
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