Microstress relaxation effect of Pb(Zr0.52Ti0.48)O-3 films with thicknesses for micro/nanopiezoelectric device

Authors
Lee, Jeong HoonHwang, Kyo SeonKim, Tae Song
Issue Date
2010-03-01
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.96, no.9
Abstract
In this study, we analyzed the microstress of Pb(Zr0.52Ti0.48)O-3 (PZT) films using Raman spectrum and the macrostress using the wafer curvature method. Based on the stress analysis, we also determined the relationship between the residual stress and piezoelectric properties. We found that a thickness of 1 mu m was critical since the stress relaxation starts due to surface roughening. Similarly, the film thickness dependence of the piezoelectric coefficient had saturation values around 1 mu m, where the preferred orientation started to change from (111) to (110), indicating that the piezoelectric response was related to the stress relaxation with a preferred orientation change.
Keywords
PB(ZR0.53TI0.47)O-3 THIN-FILMS; STRESS; ORIENTATION; PB(ZR0.53TI0.47)O-3 THIN-FILMS; STRESS; ORIENTATION; internal stresses; lead compounds; micromechanics; piezoelectric materials; piezoelectric thin films; Raman spectra; stress analysis; stress relaxation; surface roughness; texture
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/131643
DOI
10.1063/1.3330897
Appears in Collections:
KIST Article > 2010
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