Fabrication of thin solid oxide film fuel cells

Authors
Jee, Y.Chang, I.Son, J.-W.Lee, J.-H.Kang, S.Cha, S.W.
Issue Date
2010-01
Citation
Journal of the Korean Ceramic Society, v.47, no.1, pp.82 - 85
Abstract
Recently, thin film processes for oxides and metal deposition, such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), have been widely adapted to fabricate solid oxide fuel cells (SOFCs). In this paper, we presented two research area of the use of such techniques. Gadolinium doped ceria (GDC) showed high ionic conductivity and could guarantee operation at low temperature. But the electron conductivity at low oxygen partial pressure and the weak mechanical property have been significant problems. To solve these issues, we coated GDC electrolyte with a nano scale yittria-doped stabilized zirconium (YSZ) layer via atomic layer deposition (ALD). We expected that the thin YSZ layer could have functions of electron blocking and preventing ceria from the reduction atmosphere. Yittria-doped barium zirconium (BYZ) has several orders higher proton conductivity than oxide ion conductor as YSZ and also has relatively high chemical stability. The fabrication processes of BYZ is very sophisticated, especially the synthesis of thin-film BYZ. We discussed the detailed fabrication processes of BYZ as well as the deposition of electrode. This paper discusses possible cell structure and process flow to accommodate such films.
Keywords
ALD; Bi-layer; BYZ; GDC; PLD; SOFC; YSZ; Atomic layer deposition; Barium; Cerium compounds; Chemical stability; Deposition; Fabrication; Gadolinium; Ionic conduction; Mechanical properties; Oxide films; Oxygen; Physical vapor deposition; Solid oxide fuel cells (SOFC); Thin films; Zirconium; Chemical vapor deposition; ALD; Bi-layer; BYZ; GDC; PLD; SOFC; YSZ; Atomic layer deposition; Barium; Cerium compounds; Chemical stability; Deposition; Fabrication; Gadolinium; Ionic conduction; Mechanical properties; Oxide films; Oxygen; Physical vapor deposition; Solid oxide fuel cells (SOFC); Thin films; Zirconium; Chemical vapor deposition; ALD; Bi-layer; BYZ; GDC; PLD; SOFC; Thin film; YSZ
ISSN
1229-7801
URI
https://pubs.kist.re.kr/handle/201004/131845
DOI
10.4191/KCERS.2010.47.1.082
Appears in Collections:
KIST Article > 2010
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