Ion beam synthesis of Ni nanoparticles embedded in quartz
- Authors
- Kumar, P.; Kumar, Ravi; Kanjilal, D.; Knobel, M.; Thakur, P.; Chae, K. H.
- Issue Date
- 2008-07
- Publisher
- A V S AMER INST PHYSICS
- Citation
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.26, no.4, pp.L36 - L40
- Abstract
- Fabrication and fluence dependent growth of Ni nanoparticles in quartz matrix using a low energy ion implantation followed by thermal annealing are reported. 100 keV Ni ions are implanted (at room temperature) in quartz at different ion fluences using a low energy ion beam facility. The samples are postannealed at 600 degrees C and then characterized using atomic force microscopy, magnetic force microscopy, field cooled and zero field cooled magnetization measurements, x-ray absorption spectroscopy, and UV-visible spectroscopy. Nanoclusters of Ni of nearly uniform size are synthesized at an ion fluence of 5x10(16) ions/cm(2). The size of these nanoclusters could be varied by varying ion fluence. Formation of NiO nanoclusters is observed for ion fluence of 2x10(17) ions/cm(2). (c) 2008 American Vacuum Society.
- Keywords
- SILICA GLASS; NANOCLUSTERS; IMPLANTATION; PARTICLES; SILICA GLASS; NANOCLUSTERS; IMPLANTATION; PARTICLES; nanoparticle; ion implantation; x-ray absorption spectroscopy
- ISSN
- 1071-1023
- URI
- https://pubs.kist.re.kr/handle/201004/133366
- DOI
- 10.1116/1.2956624
- Appears in Collections:
- KIST Article > 2008
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