Si-based electromagnetic noise suppressors integrated with a magnetic thin film

Authors
Sohn, JaecheonHan, S. H.Yamaguchi, MasahiroLim, S. H.
Issue Date
2007-04-02
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.90, no.14
Abstract
Electromagnetic noise suppressors on Cu transmission lines and oxidized Si substrate integrated with a SiO2 dielectric and a Co-Fe-Al-O magnetic layer are presented. Extremely large signal attenuation is achieved (-90 dB at 20 GHz) while the signal reflection is relatively small, being below -10 dB. These characteristics are attributed to the distributed capacitance (C) formed by the Cu and the oxidized Si substrate and the Cu/SiO2/Co-Fe-Al-O and the distributed inductance (L) due to the magnetic thin film. The main loss mechanism is the L-C resonance and this emphasizes the role of the magnetic thin film providing the inductance. (c) 2007 American Institute of Physics.
Keywords
High frequency; Magnetic thin film; Noise suppressor; Si substrate; CoFeAlO
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/134462
DOI
10.1063/1.2719681
Appears in Collections:
KIST Article > 2007
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