Si-based electromagnetic noise suppressors integrated with a magnetic thin film
- Authors
- Sohn, Jaecheon; Han, S. H.; Yamaguchi, Masahiro; Lim, S. H.
- Issue Date
- 2007-04-02
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.90, no.14
- Abstract
- Electromagnetic noise suppressors on Cu transmission lines and oxidized Si substrate integrated with a SiO2 dielectric and a Co-Fe-Al-O magnetic layer are presented. Extremely large signal attenuation is achieved (-90 dB at 20 GHz) while the signal reflection is relatively small, being below -10 dB. These characteristics are attributed to the distributed capacitance (C) formed by the Cu and the oxidized Si substrate and the Cu/SiO2/Co-Fe-Al-O and the distributed inductance (L) due to the magnetic thin film. The main loss mechanism is the L-C resonance and this emphasizes the role of the magnetic thin film providing the inductance. (c) 2007 American Institute of Physics.
- Keywords
- High frequency; Magnetic thin film; Noise suppressor; Si substrate; CoFeAlO
- ISSN
- 0003-6951
- URI
- https://pubs.kist.re.kr/handle/201004/134462
- DOI
- 10.1063/1.2719681
- Appears in Collections:
- KIST Article > 2007
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