DSpace at KISTKIST Article2001

New antireflective coating materials containing a novel chromophore for KrF laser lithography

Authors
Ahn, K.-D.; Han, D.K.; Kim, J.-Y.; Ha, S.-H.; Lee, D.-Y.; Nam, J.-L.
Issue Date
2001-08
Publisher
Tokai University
Citation
Journal of Photopolymer Science and Technology, v.14, no.3, pp.475 - 480
Abstract
[No abstract available]
Keywords
flavone; isoflavone derivative; polymer; absorption; article; chromatophore; laser; lithography; material coating; structure analysis; surface property; technology; flavone; isoflavone derivative; polymer; absorption; article; chromatophore; laser; lithography; material coating; structure analysis; surface property; technology; Antireflective coating (ARC); Bottom ARC (BARC) materials; Isoflavone and flavone chromophores; Isoflavone polymers as BARC materials; KrF lithography
ISSN
0914-9244
URI
https://pubs.kist.re.kr/handle/201004/140302
DOI
10.2494/photopolymer.14.475
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KIST Article > 2001
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