Nano mold lithography for 40-nm patterns

Abstract

We present nano mold lithography (NML) which is adequate for high throughput sub-100-nm wafer-level lithography. The details of the house-made press machine and the recipes of the NML are explained. A silicon mold with a minimum feature size of 40 nm has been successfully imprinted on PMMA layers. Reproducible pattern transfer has been routinely achieved with a feature size of 100 nm and a maximum area of 600 mum x 200 mum. Imprinting of metal molds on PMMA layers has also been demonstrated, which opens up the possibility of using metal lift-off patterns as mold patterns.