On 1/f(gamma) noise in semiconductor devices

Authors
Lee, JIBrini, JChovet, ADimitriadis, CA
Issue Date
1999-12
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Citation
SOLID-STATE ELECTRONICS, v.43, no.12, pp.2181 - 2183
Abstract
Applying a thermal activation model, we show that the power index gamma of low frequency noise(1/f(gamma)) in semiconductor structures can often be directly related to the ratio of thermal energy and a characteristic energy of the trap distribution, when there is a significant band tail or band bending. Some examples are discussed. (C) 1999 Elsevier Science Ltd. All rights reserved.
Keywords
LOW-FREQUENCY NOISE; 1/F NOISE; FLUCTUATIONS; TRANSISTORS; SILICON; LOW-FREQUENCY NOISE; 1/F NOISE; FLUCTUATIONS; TRANSISTORS; SILICON; low frequency noise
ISSN
0038-1101
URI
https://pubs.kist.re.kr/handle/201004/141813
DOI
10.1016/S0038-1101(99)00186-0
Appears in Collections:
KIST Article > Others
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