On 1/f(gamma) noise in semiconductor devices
- Authors
- Lee, JI; Brini, J; Chovet, A; Dimitriadis, CA
- Issue Date
- 1999-12
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Citation
- SOLID-STATE ELECTRONICS, v.43, no.12, pp.2181 - 2183
- Abstract
- Applying a thermal activation model, we show that the power index gamma of low frequency noise(1/f(gamma)) in semiconductor structures can often be directly related to the ratio of thermal energy and a characteristic energy of the trap distribution, when there is a significant band tail or band bending. Some examples are discussed. (C) 1999 Elsevier Science Ltd. All rights reserved.
- Keywords
- LOW-FREQUENCY NOISE; 1/F NOISE; FLUCTUATIONS; TRANSISTORS; SILICON; LOW-FREQUENCY NOISE; 1/F NOISE; FLUCTUATIONS; TRANSISTORS; SILICON; low frequency noise
- ISSN
- 0038-1101
- URI
- https://pubs.kist.re.kr/handle/201004/141813
- DOI
- 10.1016/S0038-1101(99)00186-0
- Appears in Collections:
- KIST Article > Others
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