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The characteristics of interfacial strains developed in silicon by wet O-2 oxidation

Authors

Shin, DW; You, YH; Choi, DJ; Kim, GH

Issue Date

1999-05-15

Publisher

KLUWER ACADEMIC PUBL

Citation

JOURNAL OF MATERIALS SCIENCE LETTERS, v.18, no.10, pp.755 - 757

Keywords

STACKING-FAULTS; GROWTH; STACKING-FAULTS; GROWTH

ISSN

0261-8028

URI

https://pubs.kist.re.kr/handle/201004/142185

DOI

10.1023/A:1006664429348

Appears in Collections:

KIST Article > Others

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