The mathematical simulation of excitation processes in xenon low-pressure plasmas

Authors
Bougrove, GEKralkina, EAAntonova, TBChoi, WKJung, HJKoh, SKKondranin, SG
Issue Date
1998-03
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.32, no.3, pp.195 - 199
Abstract
The excitation mechanisms of Xe atoms in low-pressure plasmas was analyzed in the frame of the collisional radiative model. The calculations were carried out for the following plasma parameters: an atom concentration in the range of n(0) = 10(10) - 10(16) cm(-3) a degree of plasma ionization in the range of n(+)/n(0) = 10(-5) - 1, and an optical plasma thickness in the range of theta = 1(1) - 10(3). It was assumed that the electron energy distribution could be described by a Maxwell function with a temperature T-epsilon = 0.5-20 eV. For all considered plasma parameters the obtained results exhibited essentially the non-equilibrium character of atoms distribution over the excited states.
Keywords
Xenon plasma
ISSN
0374-4884
URI
https://pubs.kist.re.kr/handle/201004/143224
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