Anodic-oxide-induced interdiffusion in GaAs/AlGaAs quantum wells

Authors
Yuan, SKim, YTan, HHJagadish, CBurke, PTDao, LVGal, MChan, MCYLi, EHZou, JCai, DQCockayne, DJHCohen, RM
Issue Date
1998-02-01
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.83, no.3, pp.1305 - 1311
Abstract
Enhancement of interdiffusion in GaAs/AlGaAs quantum wells due to anodic oxides was studied. Photoluminescence, transmission electron microscopy, and quantum well modeling were used to understand the effects of intermixing on the quantum well shape. Residual water in the oxide was found to increase the intermixing, though it was not the prime cause for intermixing. Injection of defects such as group III vacancies or interstitials was considered to be a driving force for the intermixing. Different current densities used in the experimental range to create anodic oxides had little effect on the intermixing. (C) 1998 American Institute of Physics. [S0021-8979(98)04103-6].
Keywords
IMPURITY-FREE INTERDIFFUSION; WAVE-GUIDE; OPTICAL-PROPERTIES; MQW LASERS; GAAS; DIFFUSION; FABRICATION; OXIDATION; STEP; IMPURITY-FREE INTERDIFFUSION; WAVE-GUIDE; OPTICAL-PROPERTIES; MQW LASERS; GAAS; DIFFUSION; FABRICATION; OXIDATION; STEP; MOCVD; intermixing; quantum wells; quantum wires; oxidation
ISSN
0021-8979
URI
https://pubs.kist.re.kr/handle/201004/143241
DOI
10.1063/1.366830
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KIST Article > Others
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