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dc.contributor.authorKim, S.-T.-
dc.contributor.authorKim, J.-B.-
dc.contributor.authorKim, J.-M.-
dc.contributor.authorChung, C.-M.-
dc.contributor.authorAhn, K.-D.-
dc.date.accessioned2024-01-21T18:16:05Z-
dc.date.available2024-01-21T18:16:05Z-
dc.date.created2021-09-02-
dc.date.issued1997-06-
dc.identifier.issn0914-9244-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143787-
dc.description.abstract[No abstract available]-
dc.languageEnglish-
dc.publisherTokai University-
dc.titleHigh resolution single-component resists based on terpolymers having photoacid-generating camphorsulfonyloxymaleimide units-
dc.typeArticle-
dc.identifier.doi10.2494/photopolymer.10.489-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJournal of Photopolymer Science and Technology, v.10, no.3, pp.489 - 492-
dc.citation.titleJournal of Photopolymer Science and Technology-
dc.citation.volume10-
dc.citation.number3-
dc.citation.startPage489-
dc.citation.endPage492-
dc.description.journalRegisteredClassscopus-
dc.identifier.scopusid2-s2.0-0542380891-
dc.type.docTypeArticle-
dc.subject.keywordAuthorCamphorsulfnyloxymaleimide-
dc.subject.keywordAuthorPhoto-acid generation-
dc.subject.keywordAuthorTerpolymers-
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