DSpace at KIST: High resolution single-component resists based on terpolymers having photoacid-generating camphorsulfonyloxymaleimide units

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High resolution single-component resists based on terpolymers having photoacid-generating camphorsulfonyloxymaleimide units

Authors: Kim, S.-T.; Kim, J.-B.; Kim, J.-M.; Chung, C.-M.; Ahn, K.-D.

Issue Date: 1997-06

Publisher: Tokai University

Citation: Journal of Photopolymer Science and Technology, v.10, no.3, pp.489 - 492

Abstract: [No abstract available]

Keywords: Camphorsulfnyloxymaleimide; Photo-acid generation; Terpolymers

ISSN: 0914-9244

URI: https://pubs.kist.re.kr/handle/201004/143787

DOI: 10.2494/photopolymer.10.489

Appears in Collections:: KIST Article > Others

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