Effects of bottom electrode on the structural and electrical properties of PbTiO3 ferroelectric thin films

Abstract

The effect of RuOx and Pt electrodes on the crystal structure, leakage current characteristics and dielectric properties of PbTiO3 are compared with as-deposited and annealed samples. As a result, amorphous or microcrystalline PbTiO3 films on RuOx and Pt are recrystallized along the [100] direction after annealing at 600 degrees C for 30min in O-2 ambient. The leakage current density for both samples are very similar, whereas the dielectric property of RuOx/PbTiO3 is superior to that of Pt/PbTiO3 due to the large grain growth of PbTiO3 on RuOx confirmed with cross-sectional transmission electron microscopy.