Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 고석근 | - |
| dc.contributor.author | 윤경렬 | - |
| dc.contributor.author | 김석 | - |
| dc.contributor.author | 최두진 | - |
| dc.contributor.author | 김기환 | - |
| dc.date.accessioned | 2024-01-21T20:02:42Z | - |
| dc.date.available | 2024-01-21T20:02:42Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1996-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/144671 | - |
| dc.title | Chemical vapor deposition of copper films : influence of the seeding layers. | - |
| dc.type | Article | - |
| dc.description.journalClass | 3 | - |
| dc.identifier.bibliographicCitation | Mat. res. soc. proc., v.v. 427, pp.225 - ? | - |
| dc.citation.title | Mat. res. soc. proc. | - |
| dc.citation.volume | v. 427 | - |
| dc.citation.startPage | 225 | - |
| dc.citation.endPage | ? | - |
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