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dc.contributor.authorLIE, DYC-
dc.contributor.authorTHEODORE, ND-
dc.contributor.authorSONG, JH-
dc.contributor.authorNICOLET, MA-
dc.date.accessioned2024-01-21T20:40:39Z-
dc.date.available2024-01-21T20:40:39Z-
dc.date.created2021-09-01-
dc.date.issued1995-05-15-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145080-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectSI1-XGEX ALLOY LAYERS-
dc.subjectION-IMPLANTATION-
dc.subjectDAMAGE PRODUCTION-
dc.subjectSI-
dc.subjectSILICON-
dc.subjectSTRAIN-
dc.subjectSUPERLATTICES-
dc.subjectKINETICS-
dc.subjectSTRESS-
dc.subjectFILMS-
dc.titleSOLID-PHASE EPITAXIAL REGROWTH AND DOPANT ACTIVATION OF P-IMPLANTED METASTABLE PSEUDOMORPHIC GE0.12SI0.88 ON SI(100)-
dc.typeArticle-
dc.identifier.doi10.1063/1.359261-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.77, no.10, pp.5160 - 5166-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume77-
dc.citation.number10-
dc.citation.startPage5160-
dc.citation.endPage5166-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1995QY83900043-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusSI1-XGEX ALLOY LAYERS-
dc.subject.keywordPlusION-IMPLANTATION-
dc.subject.keywordPlusDAMAGE PRODUCTION-
dc.subject.keywordPlusSI-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusSTRAIN-
dc.subject.keywordPlusSUPERLATTICES-
dc.subject.keywordPlusKINETICS-
dc.subject.keywordPlusSTRESS-
dc.subject.keywordPlusFILMS-
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