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dc.contributor.authorLEE, DH-
dc.contributor.authorCHO, YS-
dc.contributor.authorYI, WI-
dc.contributor.authorKIM, TS-
dc.contributor.authorLEE, JK-
dc.contributor.authorJUNG, HJ-
dc.date.accessioned2024-01-21T20:46:07Z-
dc.date.available2024-01-21T20:46:07Z-
dc.date.created2021-09-02-
dc.date.issued1995-02-13-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145172-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleMETALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TIO2-N ANATASE THIN-FILM ON SI SUBSTRATE-
dc.typeArticle-
dc.identifier.doi10.1063/1.113430-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.66, no.7, pp.815 - 816-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume66-
dc.citation.number7-
dc.citation.startPage815-
dc.citation.endPage816-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1995QG23200012-
dc.identifier.scopusid2-s2.0-36449007803-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordAuthorchemical vapor deposition-
dc.subject.keywordAuthorTiO2-
dc.subject.keywordAuthoranatase-
dc.subject.keywordAuthorX-ray photoelectron spectroscopy-
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