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METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TIO2-N ANATASE THIN-FILM ON SI SUBSTRATE

Authors

LEE, DH; CHO, YS; YI, WI; KIM, TS; LEE, JK; JUNG, HJ

Issue Date

1995-02-13

Publisher

AMER INST PHYSICS

Citation

APPLIED PHYSICS LETTERS, v.66, no.7, pp.815 - 816

Keywords

chemical vapor deposition; TiO2; anatase; X-ray photoelectron spectroscopy

ISSN

0003-6951

URI

https://pubs.kist.re.kr/handle/201004/145172

DOI

10.1063/1.113430

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KIST Article > Others

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