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ADVANTAGE OF RAPID THERMAL ANNEALING OVER FURNACE ANNEALING FOR P-IMPLANTED METASTABLE SI/GE0.12SI0.88

Authors

LIE, DYC; SONG, JH; NICOLET, MA; THEODORE, ND

Issue Date

1995-01-30

Publisher

AMER INST PHYSICS

Citation

APPLIED PHYSICS LETTERS, v.66, no.5, pp.592 - 594

Keywords

SI1-XGEX; STRAIN; FILMS; SI; SI1-XGEX; STRAIN; FILMS; SI

ISSN

0003-6951

URI

https://pubs.kist.re.kr/handle/201004/145195

DOI

10.1063/1.114023

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KIST Article > Others

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