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Wafer surface scanner 를 이용한 반도체 웨이퍼상의 입자 침착속도의 측정

Other Titles

Measurement of particle deposition velocity toward a horizontal semiconductor wafer using a wafer surface scanner.

Authors

배귀남; 박승오; 이춘식; 명현국; 신흥태

Issue Date

1993-01

Publisher

대한설비공학회

Citation

설비공학 논문집, v.5, no.2, pp.130 - 140

Keywords

particle deposition velocity; 입자의 침착속도; semiconductor wafer; 반도체 웨이퍼; convection; 대류; diffusion; 확산; sedimentation; 중력침강

ISSN

1229-6422

URI

https://pubs.kist.re.kr/handle/201004/146218

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KIST Article > Others

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