GROWTH OF CDTE EPITAXIAL-FILMS ON PARA-INSB(111) BY TEMPERATURE-GRADIENT VAPOR TRANSPORT DEPOSITION

Authors
KIM, TWKOO, BJJUNG, MKIM, SBPARK, HLLIM, HLEE, JIKANG, KN
Issue Date
1992-01-15
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.71, no.2, pp.1049 - 1051
Abstract
The growth of high quality CdTe epitaxial films on p-InSb(111) by a simple method of temperature gradient vapor transport deposition was carried out to investigate the possibility of the existence of a two-dimensional electron gas with high mobility at CdTe/InSb heterointerfaces. From the x-ray diffraction analysis, the grown layer was found to be a CdTe epitaxial film. Photoluminescence measurements at 15 K showed that a CdTe film grown on InSb(111) in the temperature range between 180 and 280-degrees-C appeared to have an optimum crystal perfection at a substrate temperature of about 245-degrees-C. These results also indicated that the CdTe films grown above 245-degrees-C contained a significant problem due to interdiffusion from the InSb substrates during the growth.
Keywords
MOLECULAR-BEAM EPITAXY; 001 INSB; PHOTOLUMINESCENCE; INTERFACES; MOLECULAR-BEAM EPITAXY; 001 INSB; PHOTOLUMINESCENCE; INTERFACES; CdTe epitaxial films
ISSN
0021-8979
URI
https://pubs.kist.re.kr/handle/201004/146480
DOI
10.1063/1.351360
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KIST Article > Others
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