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Growth of Al//2O//3 epitaxial films on p-Si substrates by low-pressure metalorganic chemical vapor deposition.

Other Titles

저압하에서 metalorganic chemical vapor deposition 에 의한 p-Si 기판위에 Al//2O//3 결정성을 가진 박막성장 =

Authors

염상섭; 윤영수; T. W. Kim; W. N. Kang; P. H. Hur; C. Y. Kim

Issue Date

1992-01

Citation

응용물리 = Korean appl. phys., v.v. 5, pp.169 - 173

Keywords

thin films; Al//2O//3; MOCVD

URI

https://pubs.kist.re.kr/handle/201004/146553

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KIST Article > Others

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