DSpace at KIST: Effects of fluid flow on the chemical vapor deposition of Si in the system SiH//4-H//2.

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DC Field	Value	Language
dc.contributor.author	조성욱	-
dc.contributor.author	이경우	-
dc.contributor.author	조영환	-
dc.contributor.author	윤종규	-
dc.date.accessioned	2024-01-22T00:13:39Z	-
dc.date.available	2024-01-22T00:13:39Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1990-09	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/147056	-
dc.title	Effects of fluid flow on the chemical vapor deposition of Si in the system SiH//4-H//2.	-
dc.title.alternative	SiH//4-H//2 계에서 유체유동이 Si 의 화학증착에 미치는 영향 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	한국표면공학회지 = Journal of the Korean institute of surface engineering, v.v. 23, no.no. 3, pp.160 - 165	-
dc.citation.title	한국표면공학회지 = Journal of the Korean institute of surface engineering	-
dc.citation.volume	v. 23	-
dc.citation.number	no. 3	-
dc.citation.startPage	160	-
dc.citation.endPage	165	-
dc.subject.keywordAuthor	chemical vapor deposition	-
dc.subject.keywordAuthor	numerical simulation	-
dc.subject.keywordAuthor	thin film	-
dc.subject.keywordAuthor	fluid flow	-

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