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Effects of fluid flow on the chemical vapor deposition of Si in the system SiH//4-H//2.

Other Titles

SiH//4-H//2 계에서 유체유동이 Si 의 화학증착에 미치는 영향 =

Authors

조성욱; 이경우; 조영환; 윤종규

Issue Date

1990-09

Citation

한국표면공학회지 = Journal of the Korean institute of surface engineering, v.v. 23, no.no. 3, pp.160 - 165

Keywords

chemical vapor deposition; numerical simulation; thin film; fluid flow

URI

https://pubs.kist.re.kr/handle/201004/147056

Appears in Collections:

KIST Article > Others

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