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dc.contributor.author김은규-
dc.contributor.author조훈영-
dc.contributor.author홍치유-
dc.contributor.author민석기-
dc.contributor.author이호섭-
dc.contributor.author강태원-
dc.date.accessioned2024-01-22T00:32:17Z-
dc.date.available2024-01-22T00:32:17Z-
dc.date.created2022-01-10-
dc.date.issued1990-02-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147145-
dc.titleSi 이온주입된 반절연성 GaAs:Cr 의 열처리에 따른 깊은 준위연구 .-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation새물리, v.v. 30, no.no. 1, pp.41 - 46-
dc.citation.title새물리-
dc.citation.volumev. 30-
dc.citation.numberno. 1-
dc.citation.startPage41-
dc.citation.endPage46-
dc.subject.keywordAuthorSi ion implantation-
dc.subject.keywordAuthorsemi-insulating GaAs:Cr-
dc.subject.keywordAuthorthermal annealing-
dc.subject.keywordAuthordeep level-
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