Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김용태 | - |
| dc.contributor.author | 민석기 | - |
| dc.contributor.author | 홍종성 | - |
| dc.contributor.author | 김충기 | - |
| dc.date.accessioned | 2024-01-22T00:35:16Z | - |
| dc.date.available | 2024-01-22T00:35:16Z | - |
| dc.date.created | 2022-01-10 | - |
| dc.date.issued | 1990-01 | - |
| dc.identifier.issn | 0374-4884 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/147192 | - |
| dc.publisher | Korean Physical Society | - |
| dc.title | Characteristics of plasma enhanced chemical vapor deposition tungsten thin films. | - |
| dc.type | Article | - |
| dc.description.journalClass | 2 | - |
| dc.identifier.bibliographicCitation | Journal of the Korean Physical Society, v.23, pp.511 - 517 | - |
| dc.citation.title | Journal of the Korean Physical Society | - |
| dc.citation.volume | 23 | - |
| dc.citation.startPage | 511 | - |
| dc.citation.endPage | 517 | - |
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