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Characteristics of plasma enhanced chemical vapor deposition tungsten thin films.

Authors

김용태; 민석기; 홍종성; 김충기

Issue Date

1990-01

Publisher

Korean Physical Society

Citation

Journal of the Korean Physical Society, v.23, pp.511 - 517

ISSN

0374-4884

URI

https://pubs.kist.re.kr/handle/201004/147192

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KIST Article > Others

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