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dc.contributor.author김용태-
dc.contributor.author민석기-
dc.contributor.author홍종성-
dc.contributor.author염상섭-
dc.contributor.author홍치유-
dc.contributor.author김충기-
dc.date.accessioned2024-01-22T00:38:20Z-
dc.date.available2024-01-22T00:38:20Z-
dc.date.created2022-01-10-
dc.date.issued1990-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147243-
dc.titleEffects of SiH//4 on resistivity of plasma enhanced chemical vapor deposition tungsten thin films.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJournal of the Korean Physical Society, v.v. 23, pp.518 - 522-
dc.citation.titleJournal of the Korean Physical Society-
dc.citation.volumev. 23-
dc.citation.startPage518-
dc.citation.endPage522-
dc.subject.keywordAuthorthin films-
dc.subject.keywordAuthorSiH//4-
dc.subject.keywordAuthorCVD-
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