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Effects of SiH//4 on resistivity of plasma enhanced chemical vapor deposition tungsten thin films.

Authors

김용태; 민석기; 홍종성; 염상섭; 홍치유; 김충기

Issue Date

1990-01

Citation

Journal of the Korean Physical Society, v.v. 23, pp.518 - 522

Keywords

thin films; SiH//4; CVD

URI

https://pubs.kist.re.kr/handle/201004/147243

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KIST Article > Others

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