무전위 GaAs:In 의 급속열처리에 따른 깊은 준위 전자덫 연구 .

Authors
김은규조훈영박일우민석기심광보한철원조성호
Issue Date
1989-02
Citation
새물리, v.v. 29, no.no. 1, pp.50 - 54
Keywords
dislocation free; GaAs:In; rapid thermal annealing; deep level; electron trap
URI
https://pubs.kist.re.kr/handle/201004/147377
Appears in Collections:
KIST Article > Others
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