DSpace at KIST: A stydy on the necleation, growth and shrinkage of oxidation induced stacking faults(OSF);-part II : Role of SiO//2 layer on the shrinkage of oxidation induced stacking faults(OSF) in P-type CZ silico

Full metadata record

DC Field	Value	Language
dc.contributor.author	김용태	-
dc.contributor.author	민석기	-
dc.date.accessioned	2024-01-22T01:13:32Z	-
dc.date.available	2024-01-22T01:13:32Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1988-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/147608	-
dc.title	A stydy on the necleation, growth and shrinkage of oxidation induced stacking faults(OSF);-part II : Role of SiO//2 layer on the shrinkage of oxidation induced stacking faults(OSF) in P-type CZ silico	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	J. Kor. inst. telem. elec., v.v. 25, pp.767 - 772	-
dc.citation.title	J. Kor. inst. telem. elec.	-
dc.citation.volume	v. 25	-
dc.citation.startPage	767	-
dc.citation.endPage	772	-

Show Simple Item Record

KIST Library Institutional Repository