DSpace at KIST: Thermally stable, deep UV resist materials.

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DC Field	Value	Language
dc.contributor.author	안광덕	-
dc.contributor.author	S. R. Turner	-
dc.contributor.author	C. G. Willson	-
dc.date.accessioned	2024-01-22T01:38:54Z	-
dc.date.available	2024-01-22T01:38:54Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1987-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/147809	-
dc.title	Thermally stable, deep UV resist materials.	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	Polymers for high technology - electronics and photonics : ACS symposium series, v.v. 346, pp.200 - 210	-
dc.citation.title	Polymers for high technology - electronics and photonics : ACS symposium series	-
dc.citation.volume	v. 346	-
dc.citation.startPage	200	-
dc.citation.endPage	210	-

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