MgO-based magnetic tunnel junctions for spin-transfer-torque random access memory

Authors
Min, B.-C.Shin, I.-J.Choi, G.-M.Ahn, C.Langer, J.Ocker, B.Maass, W.Shin, K.-H.
Issue Date
2010-08
Publisher
IEEE
Citation
2010 10th IEEE Conference on Nanotechnology, NANO 2010, pp.144 - 147
Abstract
We illuminate how the tunnel magnetoresistance (TMR) of MgO-based magnetic tunnel junctions (MTJs) is affected by the structure, materials, and fabrication processes. First, we demonstrate a possibility to control detrimental diffusions by separating a step for obtaining a grain-to-grain epitaxy in CoFeB/MgO/CoFeB layers from a step for achieving a high exchange-bias field in the pinned layer. A high TMR and large exchange-bias field can be obtained simultaneously by circumventing Mn diffusion and minimizing Ru diffusion during the annealing process at high temperature. Second, we show that the MTJs consisting of CoFeB/ MgO/ CoFeB/ Ru/ ferromagnet (FM), where FM is Co, Ni, NiFe, CoFe, or CoFeB, can provide a reasonably high TMR and decent thermal stability, presumably useful for the memory applications. ?2010 IEEE.
ISSN
0000-0000
URI
https://pubs.kist.re.kr/handle/201004/80831
DOI
10.1109/NANO.2010.5697730
Appears in Collections:
KIST Conference Paper > 2010
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