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SiOXNY Encapsulation film Fabricated by Plasma Enhanced Chemical Vapor Deposition

Authors

Jin Chang Kyu; Do Kyung Hwang; Tae-Hwan Kim; CHOI, WON-KOOK

Citation

한국물리학회 학술논문발표회

Keywords

SiOXNY Encapsulation film; Plasma Enhanced Chemical Vapor Deposition

URI

https://pubs.kist.re.kr/handle/201004/91093

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KIST Conference Paper > Others

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