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Fabrication of SiOxNy barrier film for flexible organic photovoltaic by plasma enhanced chemical vapor deposition

Authors

Jin Chang Kyu; Do Kyung Hwang; Tae-Whan Kim; Kyung-Kon Kim; CHOI, WON-KOOK

Citation

International Conference on Microelectronics and Plasma Technology 2014

Keywords

SiOxNy barrier film; flexible organic photovoltaic; plasma enhanced chemical vapor deposition

URI

https://pubs.kist.re.kr/handle/201004/91094

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KIST Conference Paper > Others

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