Fabrication of SiOxNy barrier film for flexible organic photovoltaic by plasma enhanced chemical vapor deposition

Authors
Jin Chang KyuDo Kyung HwangTae-Whan KimKyung-Kon KimCHOI, WON-KOOK
Citation
International Conference on Microelectronics and Plasma Technology 2014
Keywords
SiOxNy barrier film; flexible organic photovoltaic; plasma enhanced chemical vapor deposition
URI
https://pubs.kist.re.kr/handle/201004/91094
Appears in Collections:
KIST Conference Paper > Others
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