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dc.contributor.authorJin Chang Kyu-
dc.contributor.authorDo Kyung Hwang-
dc.contributor.authorTae-Hwan Kimb-
dc.contributor.authorCHOI, WON-KOOK-
dc.date.accessioned2024-01-12T16:04:46Z-
dc.date.available2024-01-12T16:04:46Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/91095-
dc.languageEnglish-
dc.subjectMultilayer barrier film-
dc.subjectPECVD (Plasma Enhanced Chemical Vapor Deposition)-
dc.subjectALD(Atomic Layer Deposition)-
dc.subjectBarrier film-
dc.subjectWVTR (Water Vapor Transmission Rate)-
dc.titleMultilayer barrier film fabricated by Plasma Enhanced Chemical Vapor Deposition and Atomic Layer Deposition-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국진공학회-
dc.citation.title한국진공학회-
dc.citation.conferencePlaceKO-
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KIST Conference Paper > Others
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