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Development of Coherent Scattering Microscopy Mask Inspection System using a Coherent EUV Light Source

Other Titles

결맞는 극자외선 광원을 이용한 CSM 마스크 검사장비 개발

Authors

Jhon, Young Min; Kim Yong Soo; Ahn Joonmo; Lee, Ju han; Sung, Hamin; Kim, Jomsool; 이승범; 조현우; Park, Min-Chul; Cho, Woon Jo; Kim, Yong Tae

Citation

차세대 리소그래피 학술대회, pp.148 - 149

Keywords

Coherent Scattering Microscopy; Mask Inspection; EUV

URI

https://pubs.kist.re.kr/handle/201004/91104

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KIST Conference Paper > Others

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