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금속이온 투과방지층을 함유한 고이온선택성 복합 고분자 전해질막 제조 기술 및 이를 이용한 레독스플로우 전지

Author

안지훈; 쉬라즈; 하흥용

Assignee

한국과학기술연구원

Regitration Date

2022-05-17

Registration No.

11335931

Application Date

2019-11-22

Application No.

16/691610

Country

US

URI

https://pubs.kist.re.kr/handle/201004/91832

Appears in Collections:

KIST Patent > 2019

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