The characteristics changing of HfInZnO TFT with process conditions by RF sputter

Other Titles
스퍼터를 이용한 공정 조건에 따른 HfInZnO TFT 특성변화
Authors
Jung Da WoonChong Eu GeneKim Seung HanChun Yoon SooLee Sang Yeol
Citation
한국전기전자재료학회 추계학술대회, pp.34
URI
https://pubs.kist.re.kr/handle/201004/99047
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KIST Conference Paper > Others
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