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Showing results 1 to 4 of 4

Issue DateTitleAuthor(s)
-CD Measurements of EUV Mask using a Coherent Scattering Microscope Mask Inspection ToolKim Yong Soo; Park June; 성하민; 김점술; 이승범; 조현우; Park, Min-Chul; Cho, Woon Jo; Kim, Yong Tae; 이주한; Jhon, Young Min
-Characteristic Analysis of Coherent EUV Light Source based on High-order Harmonic GenerationKim Yong Soo; Park June; Kim Younghee; 성하민; 김점술; 이승범; 조현우; Cho, Woon Jo; Kim, Yong Tae; 이주한; Jhon, Young Min
-CSM(Coherent Scattering Microscope) system development for next generation EUV photomask inspection박한용; 김용수; 성하민; 김점술; 이승범; 조현우; 이주한; Kim, Yong Tae; Jhon, Young Min
-Development of Coherent Scattering Microscopy Mask Inspection System using a Coherent EUV Light SourceJhon, Young Min; Kim Yong Soo; Ahn Joonmo; Lee, Ju han; Sung, Hamin; Kim, Jomsool; 이승범; 조현우; Park, Min-Chul; Cho, Woon Jo; Kim, Yong Tae
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