| - | A method of improving dielectric constant and adhesion strength of methysilsesquioxyane by using a NH3 plasma treatment | 심현상; Kim Yong Tae; 김동준; 전형탁; 추상현; 차국현 |
| - | Characteristic of tungsten nitride atomic layer deposition | 심현상; Kim Yong Tae; 전형탁 |
| - | Characteristics of pulse plasma enhanced atomic layer deposition of tungsten nitride diffusion barrier for copper interconnect | 심현상; Kim Yong Tae; 전형탁 |
| - | Characteristics of W-N diffusion barrier by atomic layer chemical vapor deposition | 심현상; Kim Yong Tae; 전형탁 |
| - | Digital deposition of tungsten nitride thin layer by cyclic exposure of WF//6 and NH₃ | 심현상; 김동준; Kim Yong Tae; 전형탁; PARK YOUNG KYUN; Kim Seong Il |
| - | Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia | 심현상; 김동준; Kim Yong Tae; 전형탁 |
| - | Improvement in the characteristics of ammonia plasma treated MSQ(Methyl Silsesquioxane) | 심현상; 김동준; KIM CHUN KEUN; Kim Seong Il; Kim Yong Tae; 전형탁 |
| - | Increase of Hardness and Thermal Stability of TiAlN coatings by Nanoscale Multilayered structurization with BN phase | JONG-KEUK, PARK; Cho Jong Young; 전형탁; Baik, Young Joon |
| 1998-06 | Oxidation behavior at the interface between E-beam coated ZrO//2-7wt.%Y//2O//3 and plasma sprayed CoNiCrAlY | 최원섭; 김영도; 전형탁; 김현태; 윤국한; 홍경태; 박종구; 박원식 |
| 1997-08 | The effect of Ti/Sr ratio on abnormal grain growth of Nb-doped SrTiO3 | 배철휘; 전형탁; 김윤호; 박재관 |
| - | The study of the estimation of fracture toughness in TBCs | 이재섭; Hong Kyung Tae; KIM YOUNG DO; 전형탁 |
