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Showing results 1 to 4 of 4

Issue DateTitleAuthor(s)
-A new atomic layer deposition of tungsten nitride diffusion barrier with NH₃ pulse plasma and WF6 gasKim, Yong Tae; Hyun Sang Sim; Kim, Seong Il
-Characteristics of Pulse Plasma Atomic Layer Deposited W-C-N Diffusion Barrier for Cu InterconnectKim, Yong Tae; Hyun Sang Sim; Park Ji Ho
-Improvement of W-N diffusion barrier on silicon dioxide using pulse plasma atomic layer depositionHyun Sang Sim; Hyeongtag Jeon; Kim, Seong Il; Kim, Yong Tae
-Improvement of W-N films Using WF6 Pulse Plasma Atomic Layer DepositionHyun Sang Sim; Park Ji Ho; Kim, Seong Il; Kim, Yong Tae
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