Showing results 1 to 21 of 21
Issue Date | Title | Author(s) |
---|---|---|
2021-06-01 | Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti(OMe)(3) precursor | Chung, Hong Keun; Won, Sung Ok; Park, Yongjoo; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun |
2014-02-15 | Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (<= 100 degrees C) using O-3 as an oxygen source | Kim, Jeong Hwan; Park, Tae Joo; Kim, Seong Keun; Cho, Deok-Yong; Jung, Hyung-Suk; Lee, Sang Young; Hwang, Cheol Seong |
2023-07 | Grain boundary engineering strategy for simultaneously reducing the electron concentration and lattice thermal conductivity in n-type Bi2Te2.7Se0.3-based thermoelectric materials | Lee, Seunghyeok; Jung, Sung-Jin; Park, Gwang Min; Hong, Junpyo; Lee, Albert S.; Baek, Seung-Hyub; Kim, Heesuk; Park, Tae Joo; Kim, Jin-Sang; Kim, Seong Keun |
2016-01 | High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrate | Seok, Tae Jun; Cho, Young Jin; Jin, Hyun Soo; Kim, Dae Hyun; Kim, Dae Woong; Lee, Sang-Moon; Park, Jong-Bong; Won, Jung-Yeon; Kim, Seong Keun; Hwang, Cheol Seong; Park, Tae Joo |
2015-12-01 | Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing | Jin, Hyun Soo; Cho, Young Jin; Seok, Tae Jun; Kim, Dae Hyun; Kim, Dae Woong; Lee, Sang-Moon; Park, Jong-Bong; Yun, Dong-Jin; Kim, Seong Keun; Hwang, Cheol Seong; Park, Tae Joo |
2010-07-01 | Improved properties of Pt-HfO2 gate insulator-ZnO semiconductor thin film structure by annealing of ZnO layer | Na, Kwang Duk; Kim, Jeong Hwan; Park, Tae Joo; Song, Jaewon; Hwang, Cheol Seong; Choi, Jung-Hae |
2006-05-01 | Influence of the oxygen concentration of atomic-layer-deposited HfO2 gate dielectric films on the electron mobility of polycrystalline-Si gate transistors | Park, Jaehoo; Park, Tae Joo; Cho, Moonju; Kim, Seong Keun; Hong, Sug Hun; Kim, Jeong Hwan; Seo, Minha; Hwang, Cheol Seong; Won, Jeong Yeon; Jeong, Ranju; Choi, Jung-Hae |
2020-01 | Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition | Chung, Hong Keun; Pyeon, Jung Joon; Baek, In-Hwan; Lee, Ga-Yeon; Lee, Hansol; Won, Sung Ok; Han, Jeong Hwan; Chung, Taek-Mo; Park, Tae Joo; Kim, Seong Keun |
2024-08 | Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nm | Chung, Hong Keun; Jeon, Jihoon; Kim, Han; Jang, Myoungsu; Kim, Sung-Chul; Won, Sung Ok; Baek, In-Hwan; Chung, Yoon Jang; Han, Jeong Hwan; Cho, Sung Haeng; Park, Tae Joo; Kim, Seong Keun |
2024-07 | Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction | Ha, Min-Ji; Kang, Na-Gyeong; Kim, Woo-Hee; Park, Tae Joo; Park, Tae-Eon; Ahn, Ji-Hoon |
2023-07 | Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition | Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun |
2012-12 | Performance Variation According to Device Structure and the Source/Drain Metal Electrode of a-IGZO TFTs | Rha, Sang Ho; Jung, Jisim; Jung, Yoonsoo; Chung, Yoon Jang; Kim, Un Ki; Hwang, Eun Suk; Park, Byoung Keon; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
2012-01 | Properties of Atomic Layer Deposited HfO2 Films on Ge Substrates Depending on Process Temperatures | Jung, Hyung-Suk; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Park, Jinho; Jang, Jae Hyuck; Jeon, Sang-Ho; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
2012-09 | Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial Layers | Jung, Hyung-Suk; Yu, Il-Hyuk; Kim, Hyo Kyeom; Lee, Sang Young; Lee, Joohwi; Choi, Yujin; Chung, Yoon Jang; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
2023-04 | Selective Dissolution-Derived Nanoporous Design of Impurity-Free Bi2Te3 Alloys with High Thermoelectric Performance | Lee, seung hyeok; Jung, Sung jin; Park, Gwang Min; Minyoung Na; Kim, Kwang-Chon; Hong Junpyo; Lee, Albert S. S.; BAEK, SEUNG HYUB; Kim, Heesuk; Park, Tae Joo; Kim, Jin-Sang; Kim, Seong Keun |
2014-11-30 | SnO2 thin films grown by atomic layer deposition using a novel Sn precursor | Choi, Min-Jung; Cho, Cheol Jin; Kim, Kwang-Chon; Pyeon, Jung Joon; Park, Hyung-Ho; Kim, Hyo-Suk; Han, Jeong Hwan; Kim, Chang Gyoun; Chung, Taek-Mo; Park, Tae Joo; Kwon, Beomjin; Jeong, Doo Seok; Baek, Seung-Hyub; Kang, Chong-Yun; Kim, Jin-Sang; Kim, Seong Keun |
2019-03 | Strategic Selection of the Oxygen Source for Low Temperature-Atomic Layer Deposition of Al2O3 Thin Film | Jin, Hyun Soo; Kim, Dae Hyun; Kim, Seong Keun; Wallace, Robert M.; Kim, Jiyoung; Park, Tae Joo |
2013-10 | Study on the defects in metal-organic chemical vapor deposited zinc tin oxide thin films using negative bias illumination stability analysis | Kim, Un Ki; Rha, Sang Ho; Kim, Jeong Hwan; Chung, Yoon Jang; Jung, Jisim; Hwang, Eun Suk; Lee, Joohwi; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
2012-07 | The Impact of Carbon Concentration on the Crystalline Phase and Dielectric Constant of Atomic Layer Deposited HfO2 Films on Ge Substrate | Jung, Hyung-Suk; Jeon, Sang Ho; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Han, Seungwu; Hwang, Cheol Seong |
2024-04 | Unlocking the Potential of Porous Bi2Te3-Based Thermoelectrics Using Precise Interface Engineering through Atomic Layer Deposition | Lee, Seunghyeok; Park, Gwang Min; Kim, Younghoon; Lee, So-Hyeon; Jung, Sung-Jin; Hong, Junpyo; Kim, Sung-Chul; Won, Sung Ok; Lee, Albert S.; Chung, Yoon Jang; Kim, Ju-Young; Kim, Heesuk; Baek, Seung-Hyub; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun |
2012-05-14 | Vertically integrated submicron amorphous-In2Ga2ZnO7 thin film transistor using a low temperature process | Rha, Sang Ho; Jung, Jisim; Jung, Yoon Soo; Chung, Yoon Jang; Kim, Un Ki; Hwang, Eun Suk; Park, Byoung Keon; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |