Browsing byAuthorT. W. Kim

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Showing results 1 to 13 of 13

Issue DateTitleAuthor(s)
1991-01Behavior of C-V hysteresis in MOCVD-grown Al2O3/p-InP MIS diodes.강광남; 이정일; C. H. Kim; T. W. Kim; H. Lim; 최병두
1992-01Clear observation of the 2DEG in InGaAs/InAlAs quantum well.강광남; 이정일; T. W. Kim; M. Jung; K. H. Yoo; G. Ihm; S. J. Lee; H. L. Park
1993-01Electrical microstructural properties of BaTiO3 thin films on p-Si substrates grown by metalorganic chemical vapor deposition염상섭; 윤영수; 이종용; M. Jung; T. W. Kim; W. N. Kang; H. S. Shin
1992-01Electrical subbands in a both-side-modulation-doped In//0//.//5//2Al//0//.//4//8As/In//0//.//6//5Ga//0//.//3//5As single quantum well.강광남; 이정일; T. W. Kim; K. S. Lee; K. H. Yoo; G. Ih
1991-01Electrical subbands in an In0.65Ga0.35As quantum well between In0.52Al0.48As and In0.53Ga0.47As potential barriers.강광남; 이정일; T. W. Kim; K. S. Lee; K. H. Yoo
1992-01Growth of Al//2O//3 epitaxial films on p-Si substrates by low-pressure metalorganic chemical vapor deposition.염상섭; 윤영수; T. W. Kim; W. N. Kang; P. H. Hur; C. Y. Kim
1992-01Growth of g-Al2O3 thin films on Si by low-pressure metalorganic chemical vapor deposition염상섭; 윤영수; W. N. Kang; J. I. Lee; D. J. Choi; T. W. Kim; K. Y. Seo; P. H. Hur; C. Y. Kim
-Metal organic chemical vapor deposition of ferroelectric SrBi//2Ta//2O//9 thin films.K. B. Lee; H. S. Lee; K. W. Park; T. W. Kim; M. R. Lee; C. T. Kim; Ju Byeong Kwon
1995-01Optical and structural properties of PbTiO//3 thin films grown on indium tin oxide-coated glass by metalorganic chemical vapor deposition using the continuous cooling process.염상섭; T. W. Kim; 왕채현; D. U. Lee; Y. S. Yoon; S. J. Lee; C. O. Kim
1993-04Structural and electrical properties of BaTiO3 thin films grown on p­InSb substrate by metalorganic chemical vapor deposition at low temperature염상섭; 윤영수; W. N. Kang; T. W. Kim; M. Jung; H. J. Kim
1993-02Structural properties of BaTiO3 thin films on Si grown by metalorganic chemical vapor deposition염상섭; 윤영수; W. N. Kang; H. S. Shin; T. W. Kim; J. H. Lee; D. J. Choi; S. S. Back
1994-01Structural properties of titanium dioxide films grown on p-Si by metalorganic chemical vapor deposition at low temperature.염상섭; 윤영수; W. N. Kang; T. W. Kim; M. Jung; T. H. Park; K. Y. Seo; J. Y. Lee
-The electrical and electron emission characteristics of diamond-like carbno film prepared onto Pt-coated silicon by plasma enhanced chemial vapor depositionK. B. Lee; M. S. Kang; K. W. Park; T. W. Kim; M. R. Lee; C. T. Kim; Ju Byeong Kwon

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