null

Other Titles
CVD를 이용한 Cu 증착 시 plasma 전처리로 인한 구조적 특성의 비교 분석
Authors
진성언변동진이승무Ji Hun Park이도한최종문김창균정택모
Citation
한국재료학회
Keywords
Cu; CVD; plasma; agglomeration; seed layer
URI
https://pubs.kist.re.kr/handle/201004/101435
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE