The Structure and Properties of ta-C Film with Dispersion of Incident Beam Energy

Authors
LEE SEUNG HYEOBKim Tae YoungSEUNG CHEOL, LEEY-C. ChungD. W. BrennerLee, Kwang Ryeol
Citation
Int. Conf. Comp. Nanotechnol.
Keywords
MD; carbon; structure; stress; tetrahedral amorphous carbon; molecular dynamics simulation; Dispersed Incident Energy; compressive residual stress
URI
https://pubs.kist.re.kr/handle/201004/104835
Appears in Collections:
KIST Conference Paper > Others
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