Atomic structure of Cs layer grown on Si(001)(2 x 1) surface at room temperature

Authors
Kim, JYPark, JYSeo, JHWhang, CNKang, HJKim, SSChoi, DSChae, KH
Issue Date
2003-05-10
Publisher
ELSEVIER SCIENCE BV
Citation
SURFACE SCIENCE, v.531, no.1, pp.L340 - L346
Abstract
The atomic structure of Cs atoms adsorbed on the Si(0 0 1)(2 x 1) surface has been investigated by coaxial impact collision ion scattering spectroscopy. When 0.5 ML of Cs atoms are adsorbed on Si(0 0 1). at room temperature, it is found that Cs atoms occupy a single absorption site on T3 with a height of 3.18 +/- 0.05 Angstrom from the second layer of Si(0 0 1)(2 x 1) surface, and the bond length between Cs and the nearest Si atoms is 3.71 +/- 0.05 Angstrom. (C) 2003 Elsevier Science B.V. All rights reserved.
Keywords
ENERGY ELECTRON-DIFFRACTION; PHOTOELECTRON DIFFRACTION; ION-SCATTERING; COVERAGE; SPECTROSCOPY; ADSORPTION; CESIUM; 2X1; ENERGY ELECTRON-DIFFRACTION; PHOTOELECTRON DIFFRACTION; ION-SCATTERING; COVERAGE; SPECTROSCOPY; ADSORPTION; CESIUM; 2X1; surface structure, morphology, roughness, and topography; silicon; alkali metals; low energy ion scattering (LEIS)
ISSN
0039-6028
URI
https://pubs.kist.re.kr/handle/201004/138579
DOI
10.1016/S0039-6028(03)00378-9
Appears in Collections:
KIST Article > 2003
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