Atomic structure of Cs layer grown on Si(001)(2 x 1) surface at room temperature
- Authors
 - Kim, JY; Park, JY; Seo, JH; Whang, CN; Kang, HJ; Kim, SS; Choi, DS; Chae, KH
 
- Issue Date
 - 2003-05-10
 
- Publisher
 - ELSEVIER SCIENCE BV
 
- Citation
 - SURFACE SCIENCE, v.531, no.1, pp.L340 - L346
 
- Abstract
 - The atomic structure of Cs atoms adsorbed on the Si(0 0 1)(2 x 1) surface has been investigated by coaxial impact collision ion scattering spectroscopy. When 0.5 ML of Cs atoms are adsorbed on Si(0 0 1). at room temperature, it is found that Cs atoms occupy a single absorption site on T3 with a height of 3.18 +/- 0.05 Angstrom from the second layer of Si(0 0 1)(2 x 1) surface, and the bond length between Cs and the nearest Si atoms is 3.71 +/- 0.05 Angstrom. (C) 2003 Elsevier Science B.V. All rights reserved.
 
- Keywords
 - ENERGY ELECTRON-DIFFRACTION; PHOTOELECTRON DIFFRACTION; ION-SCATTERING; COVERAGE; SPECTROSCOPY; ADSORPTION; CESIUM; 2X1; ENERGY ELECTRON-DIFFRACTION; PHOTOELECTRON DIFFRACTION; ION-SCATTERING; COVERAGE; SPECTROSCOPY; ADSORPTION; CESIUM; 2X1; surface structure, morphology, roughness, and topography; silicon; alkali metals; low energy ion scattering (LEIS)
 
- ISSN
 - 0039-6028
 
- URI
 - https://pubs.kist.re.kr/handle/201004/138579
 
- DOI
 - 10.1016/S0039-6028(03)00378-9
 
- Appears in Collections:
 - KIST Article > 2003
 
- Export
 - RIS (EndNote)
 - XLS (Excel)
 - XML
 
  
        
        Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.