Atomic structure of Cs layer grown on Si(001)(2 x 1) surface at room temperature
- Authors
- Kim, JY; Park, JY; Seo, JH; Whang, CN; Kang, HJ; Kim, SS; Choi, DS; Chae, KH
- Issue Date
- 2003-05-10
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- SURFACE SCIENCE, v.531, no.1, pp.L340 - L346
- Abstract
- The atomic structure of Cs atoms adsorbed on the Si(0 0 1)(2 x 1) surface has been investigated by coaxial impact collision ion scattering spectroscopy. When 0.5 ML of Cs atoms are adsorbed on Si(0 0 1). at room temperature, it is found that Cs atoms occupy a single absorption site on T3 with a height of 3.18 +/- 0.05 Angstrom from the second layer of Si(0 0 1)(2 x 1) surface, and the bond length between Cs and the nearest Si atoms is 3.71 +/- 0.05 Angstrom. (C) 2003 Elsevier Science B.V. All rights reserved.
- Keywords
- ENERGY ELECTRON-DIFFRACTION; PHOTOELECTRON DIFFRACTION; ION-SCATTERING; COVERAGE; SPECTROSCOPY; ADSORPTION; CESIUM; 2X1; ENERGY ELECTRON-DIFFRACTION; PHOTOELECTRON DIFFRACTION; ION-SCATTERING; COVERAGE; SPECTROSCOPY; ADSORPTION; CESIUM; 2X1; surface structure, morphology, roughness, and topography; silicon; alkali metals; low energy ion scattering (LEIS)
- ISSN
- 0039-6028
- URI
- https://pubs.kist.re.kr/handle/201004/138579
- DOI
- 10.1016/S0039-6028(03)00378-9
- Appears in Collections:
- KIST Article > 2003
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.