Effect of glycine adsorption on polishing of silicon nitride in chemical mechanical planarzation process
- Other Titles
- CeO₂슬러리에서 glycine의 흡착이 질화규소 박막의 연마특성에 미치는 영향
- Authors
- 김태은; 임건자; 이종호; 김주선; 이해원; 임대순
- Issue Date
- 2003-01
- Publisher
- 한국세라믹학회
- Citation
- 한국세라믹학회지 (Journal of the Korean Ceramic Society), v.40, no.1, pp.77 - 80
- Keywords
- chemical mechanical planarization
- ISSN
- 1229-7801
- URI
- https://pubs.kist.re.kr/handle/201004/138917
- Appears in Collections:
- KIST Article > 2003
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.